PFC/PFN Removal Device "Clean S PF/PFN"
Decontamination of PFC, SF6, and NF3 at low temperatures below 600°C and with a decomposition rate of over 99%.
The PFC・PFN destruction device "Clean S PF・PFN" treats PFC, SF6, and NF3 at low temperatures (below 600°C) with a high decomposition rate (over 99%). Since the fluorine is fixed as a compound, no further treatment of the fluorine is necessary in subsequent stages. It features an easy-to-handle destruction column (reactor) exchange method, and the utilities required for destruction are only electricity, air, and nitrogen.
- Company：ホクエツ
- Price：Other
